공지사항
공지사항

외부공지 | 원자층 증착기술 (ALD)와 원자층 식각기술 (ALE) 국제학회 개최 안내 - 미국진공학회(AVS) 주관

아래와 같이 이번 2018년도 7 29일부터 8 1일까지 인천송도에서  원자층 증착기술 (ALD)와 원자층 식각기술 (ALE)에 관련된 국제학회가 개최됩니다.


이 학회는 미국진공학회 (AVS)의 주관으로서 ALD ALE 관련 많은 국제적 유명인사들이 참여하고 또한 Short course도 있어서 현재 반도체공정 및 장비에 관련된 많은 새로운 국제동향에 대한 지식을 쌓을 수 있는 좋은 기회입니다. Website도 둘러보시고 많은 참여를 바랍니다.

감사합니다.

 

 

 

Call for Abstracts

Deadline: February 16, 2018

 

 

The AVS 18th International Conference on Atomic Layer Deposition (ALD 2018) featuring the 5th International Atomic Layer Etching Workshop (ALE 2018) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching. The conference will take place Sunday, July 29-Wednesday, August 1, 2018, at the Songdo Convensia in Incheon, South Korea.

 

As in past conferences, the meeting will be preceded (Sunday, July 29) by one day of tutorials and a welcome reception. Sessions will take place (Monday-Wednesday, July 30-August 1) along with an industry tradeshow. All presentations will be audio-recorded and provided to attendees following the conference (posters will be included as PDFs). Anticipated attendance is 600+.



Key Deadlines:

Abstract Submission Deadline: February 16, 2018

Author Acceptance Notifications: April 9, 2018

Student Award Applications Deadline: May 1, 2018

Early Registration Deadline: June 1, 2018

Hotel Reservation Deadline: June 26, 2018

JVST Special Issue Deadline: September 5, 2018

 

 

 

 

ALD Program Chairs

 

Program Chair:

Jin-Seong Park

Hanyang Univ., South Korea

 

Program Co-Chair:

Hanjin Lim

Samsung Electronics, South Korea

 

Program Co-Chair: HyunChul Choi

LG Display, South Korea

ALE Program Chairs

 

Program Chair:

Geun Young Yeom

Sungkyunkwan Univ., South Korea

 

Program Co-Chair:

Ankur Agarwal

KLA-Tencor, USA

 

 

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